Coated article including low-emissivity coating insulating glass unit including coated article, and/or methods of making the same

ABSTRACT

Certain example embodiments relate to a coated article including at least one infrared (IR) reflecting layer of a material such as silver or the like in a low-E coating, and methods of making the same. In certain cases, at least one layer of the coating is of or includes nickel and/or titanium (e.g., Ni x Ti y O z ). The provision of a layer including nickel titanium and/or an oxide thereof may permit a layer to be used that has good adhesion to the IR reflecting layer, and reduced absorption of visible light (resulting in a coated article with a higher visible transmission). When a layer including nickel titanium oxide is provided directly over and/or under the IR reflecting layer (e.g., as a barrier layer), this may result in improved chemical and mechanical durability. Thus, visible transmission may be improved if desired, without compromising durability; or, durability may simply be increased.

This application claims the benefit of U.S. application Ser. No.61/446,411, filed on Feb. 24, 2011, the entire contents of which arehereby incorporated herein by reference. This application alsoincorporates by reference the entire contents of U.S. Application SerialNo. 13/______ (atty. dkt. no. 3691-2195), entitled “Barrier LayersComprising Ni and/or Ti, Coated Articles Including Barrier Layers, andMethods of Making the Same,” as well as U.S. Application Serial No.13/______ (atty. dkt. no. 3691-2315), entitled “Barrier LayersComprising Ni-Inclusive Ternary Alloys, Coated Articles IncludingBarrier Layers, and Methods of Making the Same.”

Certain example embodiments of this application relate to a coatedarticle including at least one infrared (IR) reflecting layer of amaterial such as silver or the like in a low-E coating. In certainembodiments, at least one layer of the coating is of or includes nickeland/or titanium (e.g., Ni_(x)Ti_(y), Ni_(x)Ti_(y)O_(z), etc.). Incertain example embodiments, the provision of a layer comprising nickeltitanium and/or an oxide thereof permits a layer to be used that hasgood adhesion to the IR reflecting layer, and reduced absorption ofvisible light (resulting in a coated article with a higher visibletransmission). When a layer comprising nickel titanium oxide is provideddirectly over and/or under the IR reflecting layer (e.g., as a barrierlayer), this results in improved chemical and mechanical durability incertain example embodiments. Thus, in certain example embodiments,visible transmission may be improved if desired, while having a reducedimpact on durability. Coated articles herein may be used in the contextof insulating glass (IG) window units, vehicle windows, or in othersuitable applications such as monolithic window applications, laminatedwindows, and/or the like.

BACKGROUND AND SUMMARY OF EXAMPLE EMBODIMENTS OF THE INVENTION

Coated articles are known in the art for use in window applications suchas insulating glass (IG) window units, vehicle windows, monolithicwindows, and/or the like. In certain example instances, designers ofcoated articles often strive for a combination of high visibletransmission, low emissivity (or low emittance), and/or low sheetresistance (R_(s)). High visible transmission may permit coated articlesto be used in applications where these characteristics are desired suchas in architectural or vehicle window applications, whereaslow-emissivity (low-E), and low sheet resistance characteristics permitsuch coated articles to block significant amounts of IR radiation so asto reduce for example undesirable heating of vehicle or buildinginteriors. Thus, typically, for coatings used on architectural glass toblock significant amounts of IR radiation, high transmission in thevisible spectrum is often desired.

The IR reflecting layer(s) in low-E coatings impact the overall coating,and in some cases the IR reflecting layer(s) is the most sensitive layerin the stack. Unfortunately, IR reflecting layers comprising silver maysometimes be subject to damage from the deposition process, subsequentatmospheric processes, and/or heat treatment. In certain cases, asilver-based layer in a low-E coating may need to be protected fromoxygen present while other layers are deposited over the silver-basedlayer. If the IR reflecting layer(s) in the coating is/are notsufficiently protected, the durability, visible transmission, and/orother optical characteristics of the coated article may suffer.

Accordingly, it will be appreciated by one skilled in the art that thethere is a need for a low-E coating with improved durability andimproved or substantially unchanged optical properties.

Certain example embodiments of this invention relate to an improvedbarrier layer material used in connection with an IR reflecting layercomprising silver. In certain instances, the improved barrier layermaterial may permit the durability of the coated article to be improved.Such barrier layers may include Ni and Ti, or an oxide thereof indifferent embodiments of this invention.

Certain example embodiments relate to a method of making a coatedarticle including a coating supported by a glass substrate. At least onefirst dielectric layer is disposed on the substrate. A first layercomprising Ag is disposed on the at least one first dielectric layer. Alayer comprising Ni and/or Cr is disposed over and contacting the firstlayer comprising Ag. At least one second dielectric layer is disposed onthe layer comprising Ni and/or Cr. A second layer comprising Ag isdisposed on the at least one second dielectric layer. A first layercomprising Ni and Ti is disposed over and contacting the second layercomprising Ag. At least one third dielectric layer is disposed on thefirst layer comprising Ni and Ti. A third layer comprising Ag isdisposed on the at least one third dielectric layer. A second layercomprising Ni and Ti is disposed over and contacting the third layercomprising Ag. At least one fourth dielectric layer is disposed on thesecond layer comprising Ni and Ti.

Certain example embodiments relate to a method of making a coatedarticle including a coating supported by a glass substrate. At least onefirst dielectric layer is disposed on the substrate. A first layercomprising Ag is disposed on the at least one first dielectric layer. Alayer comprising Ni and/or Cr is disposed over and contacting the firstlayer comprising Ag. At least one second dielectric layer is disposed onthe layer comprising Ni and/or Cr. A second layer comprising Ag isdisposed on the at least one second dielectric layer. A first layercomprising Ni and/or Ti is disposed over and contacting the second layercomprising Ag. At least one third dielectric layer is disposed on thefirst layer comprising Ni and/or Ti. A third layer comprising Ag isdisposed on the at least one third dielectric layer. A second layercomprising Ni and/or Ti is disposed over and contacting the third layercomprising Ag. At least one fourth dielectric layer is disposed on thesecond layer comprising Ni and/or Ti. The third layer comprising Ag isthicker than the second layer comprising Ag.

Certain example embodiments also relate to coated articles and/or IGunits made by one of the above-described and/or other methods. In IGunit embodiments, for example, the coating of the coated article may beprovided on surface 2 and/or 3.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-sectional view of a coated article according to anexample embodiment of this invention.

FIG. 2 is a cross-sectional view of a coated article according toanother example embodiment of this invention.

FIG. 3 is a cross-sectional view of a coated article according to afurther embodiment of this invention.

FIG. 4 is a cross-sectional view of a coated article according to stillfurther example embodiments of this invention.

FIG. 5 is a cross-sectional view of a coated article according to stillanother example embodiment of this invention.

FIG. 6 is a detailed cross-sectional view of an example coated articlein accordance with an example embodiment.

FIG. 7 is another detailed cross-sectional view of an example coatedarticle in accordance with an example embodiment

DETAILED DESCRIPTION OF THE INVENTION

Referring now to the drawings in which like reference numerals indicatelike parts throughout the several views.

Coated articles herein may be used in coated article applications suchas monolithic windows, IG window units, vehicle windows, and/or anyother suitable application that includes single or multiple substratessuch as glass substrates.

As indicated above, in certain cases, a silver-based layer in a low-Ecoating may need to be protected during subsequent processes. Forexample, the oxygen in the plasma used to deposit subsequent layers maybe highly ionized and the silver-based layer may need to be protectedfrom it. Also, in post-deposition “atmospheric processes,” thesilver-based layer may be susceptible to attacks from oxygen, moisture,acids, bases, and/or the like. This may be particularly true if a layerlocated between the silver-based layer and the atmosphere has anydefects, such that the silver-based layer is not covered entirely (e.g.,scratches, pin holes, etc.).

Furthermore, problems may arise during heat-treating in certain exampleembodiments. In those cases, oxygen may diffuse into the silver-basedlayer. In certain example embodiments, oxygen that reaches thesilver-based layer may affect its properties, such as by decreasingsheet resistance, affecting emissivity, and/or producing haze, etc., andmay result in reduced performance by the layer stack.

In certain example embodiments, barrier layers may therefore be usedwith silver-based layers (and/or other IR reflecting layers) in low-Ecoatings in order to reduce the occurrence of some or all of theabove-described and/or other issues.

In the past, barrier layer materials have comprised thin metalliclayers, such as Al, that were oxidized during the subsequent oxidicprocess in certain example cases. In other cases, indium tin oxide(ITO)-based layers were also used. However, these materials maycompromise optical properties and/or durability of the overall layerstack in certain of such cases.

Materials such as chromium may be used in barrier layers in certaincases; particularly in coated articles with low-E coatings used in thearchitectural market. However, chromium may absorb significant amountsvisible light in certain example embodiments. The absorption, k, ofchromium oxide at 550 nm is 0.033942. Accordingly, the visibletransmission of a coated article may be reduced if a layer comprisingchromium is too thick, and/or not oxided enough. However, the layercomprising silver may not be thoroughly protected if the thickness ofthe barrier is not sufficient.

Another barrier layer material that may be used is titanium (e.g.,TiOx). However, the adhesion of titanium to IR reflecting layers,particularly those that comprise silver, is lacking. Therefore, when amaterial consisting of or consisting essentially of Ti and/or oxidesthereof is used as a barrier layer to protect a layer comprising silver,the durability of the coated article may be compromised and/or reduced.

In view of the foregoing, it would be advantageous to provide a barrierlayer comprising material(s) that have sufficient adhesion at theinterface between the silver (and/or IR reflecting layer) and thebarrier material, where the oxide of the barrier material(s) has a lowerabsorption in the visible spectral range.

Certain embodiments of this invention relate to a coated article thatincludes at least one glass substrate supporting a coating. The coatingtypically has at least one infrared (IR) reflecting layer that reflectsand/or blocks at least some IR radiation. The IR reflecting layer(s) maybe of or include a material such as silver, gold, NiCr or the like indifferent embodiments of this invention. Often, an IR reflecting layeris sandwiched between at least first and second contact layers of thecoating.

In certain example embodiments of this invention, it has surprisinglybeen found that the provision of a layer consisting essentially of, orcomprising, an oxide of nickel and/or titanium (e.g., Ni_(x)Ti_(y) orNi_(x)Ti_(y)O_(z), etc.) as a contact layer(s) (e.g., in contact with anIR reflecting layer) in such a coating unexpectedly improves themechanical and chemical durability of the coating in a manner that doesnot significantly degrade other optical properties of a coated articlesuch as visible transmission and/or color. One or more such nickeland/or titanium inclusive layers (which may be oxided in certain exampleembodiments) may be provided in a given coating in different embodimentsof this invention. Moreover, such nickel and/or titanium inclusivelayer(s) may be provided in any type of solar control or low-E(low-emissivity, or low-emittance) coating in different embodiments ofthis invention (e.g., as a contact layer), and the specific low-Ecoatings described herein are for purposes of example only unlessrecited in the claim(s). When a layer comprising nickel titanium oxideis provided as the upper contact layer of the coated article (e.g., overa silver based IR reflecting layer), this results in improved chemicaland mechanical durability in certain example embodiments. The use of alayer of nickel titanium oxide in this respect (e.g., as a contactlayer) has surprisingly been found to improve chemical and mechanicaldurability of the coated article, and has also been found to improve (orat least not substantially degrade) the visible transmission of thecoated article.

In certain example embodiments, a barrier layer comprising nickeltitanium and/or an oxide thereof may be provided. This combination of Niand Ti may provide good adhesion with lower absorption, which are bothdesirable qualities for low-E coatings in certain example embodiments.Advantageously, the provision of a barrier layer comprising nickeltitanium and/or an oxide thereof (e.g., Ni_(x)Ti_(y), Ni_(x)Ti_(y)O_(z),etc.) may permit a durable, monolithic coated article with a single IRreflecting layer (e.g., silver) to be utilized, without the propertiesof the coating degrading because of insufficient protection of the IRreflecting layer.

FIG. 1 is a cross-sectional view of a coated article according to anexample embodiment of this invention. In certain example embodiments,the coated article illustrated in FIG. 1 may be used as a monolithicwindow with a low-E coating on surface 1 and/or 2, where the low-Ecoating includes only a single IR reflecting layer. However, in otherexample embodiments, the coated article in FIG. 1 may comprise furtherlayers. Furthermore, a coated article made according to exampleembodiments described herein may be used in an insulated glass unit(IGU), with the coating(s) on surface 1, 2, 3, and/or 4; in a laminatedmonolithic lite with the coating embedded against the interlayer onsurfaces 2 and/or 3, or exposed on surface 4; in a laminated IGU, with alaminate outboard with the coating embedded against the interlayer onsurfaces 2 and/or 3, or exposed on surface 4; in a laminated IGU, with alaminated inboard with the coated exposed on surfaces 3 and/or 6, orembedded on surfaces 4 and/or 5, according to different exampleembodiments and applications. In other words, this coating may be usedmonolithicly, or in IG units comprising two or more substrates, or morethan once in a glass unit, and may be provided on any surface of theunit in different example embodiments.

The coated article includes glass substrate 1 (e.g., clear, green,bronze, or blue-green glass substrate from about 1.0 to 10.0 mm thick,more preferably from about 1.0 mm to 6.0 mm thick), and a multi-layercoating 35 (or layer system) provided on the substrate either directlyor indirectly.

As shown in FIG. 1, the coating 35 comprises optional dielectriclayer(s) 3 and/or 5, lower contact layer 7, which may be of or includenickel and/or titanium and/or an oxide thereof (e.g., Ni_(x)Ti_(y),Ni_(x)Ti_(y)O_(z), etc.), or which may be of another suitable contactlayer material such as oxides and/or nitrides of Zn, Ni, Cr,combinations thereof, and/or the like, IR reflecting layer 9 includingone or more of silver, gold, or the like, upper contact layer 11 of orincluding nickel and/or titanium and/or an oxide thereof (e.g.,Ni_(x)Ti_(y), Ni_(x)Ti_(y)O_(z), etc.) or another suitable contact layermaterial, optional dielectric layer(s) 13 and/or 15, and dielectriclayer 16 of or including a material such as silicon oxide, siliconnitride, silicon oxynitride, zirconium oxide, zirconium oxynitride, orzirconium silicon oxynitride that may in certain example instances be aprotective overcoat. Other layers and/or materials may also be providedin certain example embodiments of this invention, and it is alsopossible that certain layers may be removed or split in certain exampleinstances. Layer 16 may or may not be provided according to differentexample embodiments.

Optional dielectric layers 3 and/or 5 may comprise silicon nitride,titanium oxide, tin oxide, silicon oxide, silicon oxynitride, and/orother dielectric materials according to different example embodiments.

Infrared (IR) reflecting layer 9 is preferably substantially or entirelymetallic and/or conductive, and may comprise or consist essentially ofsilver (Ag), gold, or any other suitable IR reflecting material. IRreflecting layer 9 helps allow the coating to have low-E and/or goodsolar control characteristics such as low emittance, low sheetresistance, and so forth. The IR reflecting layer 9 may, however, beslightly oxidized in certain embodiments of this invention.

The IR reflecting layers shown in FIG. 1 and described herein maycomprise or consist essentially of silver in different exampleembodiments. Thus, it will be appreciated that certain exampleembodiments may include silver alloys. In such cases, Ag may be alloyedwith an appropriate amount of Zr, Ti, Ni, Cr, Pd, and/or combinationsthereon. In certain example embodiments, Ag may be alloyed with both Pdand Cu, with approximately 0.5-2% (by weight or atomic %) of each of Pdand Cu. Other potential alloys include Ag and one or more of Co, C, Mg,Ta, W, NiMg, PdGa, CoW, Si, Ge, Au, Pt, Ru, Sn, Al, Mn, V, In, Zn, Ir,Rh, and/or Mo. In general, dopant concentrations may be in the range of0.2-5% (by weight or atomic %), more preferably between 0.2-2.5%.Operating within these ranges may help the silver maintain the desirableoptical characteristics of the Ag-based layer that otherwise might belost by virtue of the alloying, thereby helping to maintain the overalloptical characteristics of the stack while also enhancing chemical,corrosion, and/or mechanical durability. The example Ag alloy targetmaterials identified herein may be sputtered using a single target,deposited by co-sputtering using two (or more targets), etc. In additionto providing improved corrosion resistance, the use of Ag alloys may incertain instances help to reduce the silver diffusivity at elevatedtemperatures while also helping to reduce or block the amount of oxygenmovement in the layer stacks. This may further enhance silverdiffusivity and may change those Ag growth and structural propertiesthat potentially lead to bad durability.

The upper and lower contact layers 7 and 11 may be of or include Niand/or Ti, and/or oxides and/or nitrides thereof. In certain exampleembodiments, upper and lower contact layers 7, 11 may be of or includenickel (Ni), titanium (Ti), chromium/chrome (Cr), a nickel alloy such asnickel titanium (NiTi) and/or nickel chromium, (e.g., NiCr), Haynesalloy, zinc, an oxide, nitride, or oxynitride of any of these (e.g.,Ni_(x)Ti_(y)O_(z)), or other suitable material(s). For example, one ofthese layers may be of or include zinc oxide instead of NiTi (and/or anoxide thereof).

The use of, for example, NiTi and/or Ni_(x)Ti_(y)O_(z) in these layersallows durability and/or visible transmission of a coated article to beimproved in certain example instances. In certain example embodiments,even a fully oxidized layer of NiCrOx may have a relatively highresidual absorption, due to the absorption of CrOx, which is k(550nm)=0.033942. However, it has advantageously been found that becauseTiOx has a significantly lower absorption than CrOx, in certain exampleembodiments the inclusion of TiOx in a barrier layer may result inhigher visible transmission of a coated article. For example, theabsorption of TiOx k at 550 nm is 0.004806, which is almost 1/10^(th) ofthe absorption of CrOx. Therefore, when a metal or metal oxide with anabsorption lower than that of CrOx is used in a barrier layer, thevisible transmission of the coated article may be improved.

However, in certain example embodiments, a barrier layer comprising TiOxmay not sufficiently adhere to an IR reflecting layer. Thus, if abarrier layer consisting only of TiOx is used, the durability of acoated article may suffer. It has advantageously been found, though,that by using an alloy including a material that does adhere well to IRreflecting layers, with Ti and/or TiOx, the durability of the coatedarticle will not be as compromised by the substitution of Ti and/or TiOx(or any material with a relatively low absorption) for Cr and/or CrOx.Advantageously, Ni is thought to adhere well to IR reflecting layers.Thus, the use of a barrier layer including Ni and Ti, as well as oxidesand/or nitrides thereof, may advantageously result in a coated articlethat has an improved visible transmission and adequate durability.

Contact layers 7 and 11 (e.g., of or including Ni and/or Ti) may or maynot be continuous in different embodiments of this invention across theentire IR reflecting layer. In certain example embodiments, one or bothof the NiTi layers 7, 11 includes from about 1-50% Ni, and from about50-99% Ti. An example is 80% Ti and 20% Ni. In certain exampleembodiments, the layer comprising Ni_(x)Ti_(y) may be fully and/orpartially oxided. This oxidation may occur as the layer is deposited, ormay be due to processes performed after the deposition of the contactlayer; for example, from the deposition of subsequent layers in thepresence of oxygen, from heat treatment, etc.

However, the Ni and Ti may still be present in the same ratio asdiscussed above, regardless of the presence of oxygen. For example, evenin a layer comprising nickel titanium oxide, the ratio of Ni to Ti maystill be from about 1:99 to 50:50 (percentages and ratios ofNi_(x)Ti_(y) given by weight).

As mentioned above, the Ni_(x)Ti_(y) and/or Ni_(x)Ti_(y)O_(z) layer(s) 7and/or 11 may be fully oxidized in certain embodiments of this invention(e.g., fully stoichiometric), or alternatively may only be partiallyoxidized (e.g., substoichiometric) (before and/or after optional HT). Inother cases, layers 7 and/or 11 may be deposited as metallic layers, andmay be fully or partially oxidized during post-deposition processes,such as the deposition of subsequent layers in the presence of oxygen,heat treatment, and the like. In certain instances, the Ni_(x)Ti_(y)and/or Ni_(x)Ti_(y)O_(z) layer 7 and/or 11 may be at least about 50%oxidized.

Contact layer(s) 7 and/or 11 (e.g., of or including an oxide of Niand/or Ti) may or may not be oxidation graded in different embodimentsof this invention. As is known in the art, oxidation grading involveschanging the degree of oxidation in the layer through the thickness ofthe layer so that, for example, a contact layer may be graded so as tobe less oxidized at the contact interface with the immediately adjacentIR reflecting layer 9 than at a portion of the contact layer further ormore/most distant from the immediately adjacent IR reflecting layer.Descriptions of various types of oxidation graded contact layers are setforth in U.S. Pat. No. 6,576,349, the disclosure of which is herebyincorporated herein by reference. Contact layer(s) 7, 11 (e.g., of orincluding an oxide of Ni and/or Ti) may or may not be continuous indifferent embodiments of this invention across the entire IR reflectinglayer 9.

In other example embodiments, the contact layer underneath an IRreflecting layer (e.g., the lower contact layer 7) may be of or includezinc and/or an oxide thereof

Optional dielectric layers 13 and/or 15 may be of or include siliconnitride (e.g., Si_(x)N_(y)) or any other suitable material in certainexample embodiments of this invention such as titanium oxide, tin oxide,silicon oxynitride and/or silicon oxide. These layers may help withdurability issues, and/or may also protect the underlying layers, and insome case, optionally for antireflective purposes.

Optional overcoat layer 16 including, for example, zirconium oxide mayalso be included. U.S. patent application Ser. No. 12/213,879, which ishereby incorporated by reference, discusses advantages associated withthe use of zirconium oxide as an overcoat. In other example embodiments,the optional overcoat 16 may be of or include silicon nitride, siliconoxide, and/or silicon oxynitride. Optional overcoat 16 may also includeother zirconium-containing compounds in still further exampleembodiments.

In certain example embodiments, the coated article illustrated in FIG. 1may be used as a monolithic window with a low-E coating with a single IRreflecting layer. However, in other example embodiments, a coatedarticle as described herein may be used with any number of IR reflectinglayers and maybe combined with any number of other glass substrates tocreate a laminated and/or insulated glass unit. The coatings may also beused in connection with IGU, VIG, automotive glass, and any otherapplications, according to different example embodiments.

FIG. 2 is another example embodiment of a low-E coating 35′ with asingle IR reflecting layer. In the FIG. 2 embodiment, theNi_(x)Ti_(y)O_(z)-based layer is used as the upper and lower contactlayers. Further, in FIG. 2, a silicon nitride-based layer is used asdielectric layer 3, while dielectric layer 5 is omitted. Dielectriclayer 13 comprises silicon nitride, and the overcoat layer 16 isomitted, inasmuch as the dielectric layer 13 also may help serveovercoat layer purposes (such as, for example, by protecting theunderlying layers) in the FIG. 2 embodiment. In certain exemplaryembodiments, the coated article of FIG. 2 may have improved visibletransmission, and may also have improved and/or substantially unaffectedchemical and mechanical durability.

TABLE 1 Example Materials/Thicknesses; FIG. 2 Embodiment Preferred RangeMost Preferred Layer ({acute over (Å)}) ({acute over (Å)}) Ex. (Å) Glass(1-10 mm thick) Si_(x)N_(y) (layer 3) 70-1200 Å 250-400 Å 382 ÅNi_(x)Ti_(y)O_(z) (layer 7) 5-200 Å 10-50 Å 15 Å Ag (layer 9) 20-700 Å30-300 Å 120 Å Ni_(x)Ti_(y)O_(z) (layer 11) 5-200 Å 10-45 Å 15 ÅSi_(x)N_(y) (layer 14) 40-1200 Å 250-400 Å 330 Å

TABLE 2 Example Characteristics; FIG. 2 Embodiment Description Y L* a*b* As-coated (Transmission) 66.16 85.08 −1.59 −3.44 As-coated (Glassside) 6.79 31.32 3.53 6.71 As-coated (Film side) 5.62 28.43 3.73 −7.18After HT (Transmission) 69.18 86.59 −2.6 −3.89 After HT (Glass side)6.44 30.5 7.25 8.14 After HT (Film side) 5.74 28.74 5.92 −4.9

The FIG. 2 example embodiment may have a sheet resistance ofapproximately 11.15 ohms/square in certain example implementations.However, as is known by those skilled in the art, sheet resistanceand/or emissivity may be adjusted by, among other things, adjusting thethickness of the Ag-based layer.

In other words, in certain example embodiments, a monolithic coatedarticle having one IR reflecting layer may have a visible transmissionof at least about 55%, preferably at least about 60%, and still morepreferably at least about 65%, and sometimes at least about 67%, asdeposited. After heat treatment, the monolithic coated article may havea higher visible transmission, e.g., of at least about 60%, morepreferably from about 65%, with an example transmission of about 70%.

As coated, the article may have a glass side a* value of from about 0 to5, more preferably from about 1 to 4, with an example being around 3.5in certain example embodiments. As coated, the article may have a glassside b* value of from about 0 to 10, more preferably from about 1 to 7,with an example being around 6.7 in certain example embodiments. In somecases, an article may have a film side a* value of from about 0 to 5,more preferably from about 1 to 4, with an example being around 3.7, ascoated. In other example embodiments, an article may have a film side b*value of from about −10 to 1, more preferably from about −8 to −2, withan example being about −7.18.

After heat treatment (expressed as “HT” in Table 2), the article mayhave a glass side a* value of from about 0 to 10, more preferably fromabout 1 to 8, with an example being around 7.25 in certain exampleembodiments. As coated, the article may have a glass side b* value offrom about 0 to 10, more preferably from about 1 to 9, with an examplebeing around 8.14 in certain example embodiments. In some cases, anarticle may have a film side a* value of from about 0 to 8, morepreferably from about 1 to 6, with an example being around 5.92, ascoated. In other example embodiments, an article may have a film side b*value of from about −8 to 1, more preferably from about −6 to −2, withan example being about −4.9.

FIG. 3 is another example embodiment of a low-E coating 35″ with asingle IR reflecting layer. FIG. 3 is similar to the FIG. 1 and FIG. 2embodiments, but in the FIG. 3 embodiment, the Ni_(x)Ti_(y)O_(z)-basedlayer is used as the upper contact layer 11, while a zinc oxide-basedlayer is used as the lower contact layer 7. Further, in FIG. 3, asilicon nitride-based layer is used as dielectric layer 3, whiledielectric layer 5 is omitted. Dielectric layer 13 comprises siliconnitride in the FIG. 3 embodiment. In certain exemplary embodiments, thecoated article of FIG. 3 may have improved and/or unaffected chemicaland mechanical durability, and may also have increased visibletransmission.

FIG. 4 is a cross-sectional view of a coated article according to anexample embodiment of this invention. In certain example embodiments,the coated article illustrated in FIG. 4 may be used as a monolithicwindow with a low-E coating with double IR reflecting layers. The coatedarticle includes glass substrate 1 (e.g., clear, green, bronze, orblue-green glass substrate from about 1.0 to 10.0 mm thick, morepreferably from about 1.0 mm to 6 0 mm thick), and a multi-layer coating(or layer system) provided on the substrate either directly orindirectly. Similarly to FIG. 1, coating 45 of FIG. 4 includes optionaldielectric layer(s) 3 and/or 5, first lower contact layer 7, first IRreflecting layer 9 including or of silver, gold, or the like, firstupper contact layer 11 of or including an oxide of nickel titanium(e.g., Ni_(x)Ti_(y)O_(z)), optional dielectric layer(s) 13 and/or 15(e.g., of or including silicon nitride), second lower contact layer 17,second IR reflecting layer 19, second upper contact layer 21, optionaldielectric layers 23 and/or 25, and optional dielectric layer 16 of orincluding a material such as silicon nitride, silicon oxynitride,zirconium oxide, zirconium oxynitride, or zirconium silicon oxynitridewhich may in certain example instances be a protective overcoat. Otherlayers and/or materials may also be provided in certain exampleembodiments of this invention, and it is also possible that certainlayers may be removed or split in certain example instances.

In certain example embodiments, only one of the contact layers 7, 11,17, and 21 may comprise nickel titanium and/or an oxide and/or nitridethereof. In further example embodiments, the upper contact layers may beof or include Ni_(x)Ti_(y) and/or Ni_(x)Ti_(y)O_(z), while the lowercontact layers may be of or include oxides and/or nitrides of zinc,nickel, chromium, titanium, and/or a combination of these materials.However, in other example embodiments, more than one, or even all of thecontact layers, may be of or include nickel titanium and/or oxidesand/or nitrides thereof

FIG. 5 is a cross-sectional view of a coated article according to afurther example embodiment of this invention. In certain exampleembodiments, the coated article illustrated in FIG. 5 may include threeIR reflecting layers (e.g., a triple silver layer stack). The coatedarticle includes glass substrate 1 (e.g., clear, green, bronze, orblue-green glass substrate from about 1.0 to 10.0 mm thick, morepreferably from about 1.0 mm to 6.0 mm thick), and a multi-layer coating55 (or layer system) provided on the substrate either directly orindirectly.

In certain example embodiments, coating 55 of FIG. 5 may compriseoptional dielectric layer 3 of or including silicon nitride, optionaldielectric layer 5 of or including titanium oxide, lower contact layer 7of or including an oxide of zinc, IR reflecting layer 9 of or includingsilver, upper contact layer 11 of or including Ni and/or Cr, or an oxidethereof, optional dielectric layer 12 of or including titanium oxide,optional dielectric layer 13 of or including tin oxide, dielectric layer14 of or including silicon nitride (or some other silicon-inclusive orother material), dielectric layer 15, of or including tin oxide, secondlower contact layer 17 of or including zinc oxide, second IR reflectinglayer 19 of or including silver, second upper contact layer 21 of orincluding nickel and/or titanium or an oxide thereof, dielectric layer23 of or including tin oxide, dielectric layer 24 of or includingsilicon nitride (or some other silicon-inclusive or other material),dielectric 24 of or including tin oxide, third lower contact layer 27 ofor including zinc oxide, third IR reflecting layer 29 of or includingsilver, third upper contact layer 31 of or including Ni and/or Ti or anoxide thereof, dielectric layer 32 of or including tin oxide, anddielectric layer 16 of or including silicon nitride, which may incertain example instances be a protective overcoat. Other layers and/ormaterials may also be provided in certain example embodiments of thisinvention, and it is also possible that certain layers may be removed orsplit in certain example instances. Further, in other exampleembodiments, one or more of upper contact layers 11, 21, and 31 maycomprise nickel chromium and/or an oxide thereof, rather than an oxideof nickel titanium. Moreover, any of layers 7, 11, 17, 21, 27, and/or 31may be of or include nickel, titanium, chromium, zinc,combinations/alloys thereof, and may further include oxygen and/ornitrogen. Thus, any or all of upper contact layers 11, 21, and 31 may beNi and/or Ti inclusive layers (e.g., layers comprising NiTiOx) indifferent embodiments of this invention.

The layers comprising NiTiOx may help provide high performance coatings,inasmuch as the NiTiOx may help to lower overall emissivity whilemaintaining a good silver quality. Furthermore, as alluded to above, theNi in such layers may help with durability issues while the Ti may helpwith transmission. It is noted that certain example embodiments mayreplace the NiTiOx with Ti metal or TiOx.

In certain example embodiments, the layers comprising NiTiOx may bedeposited slightly oxided or metal and then become substantially fullyoxided later via subsequent processing (e.g., during sputtering ofsubsequently deposited layers). The NiTiOx also may be graded in certainexample embodiments as it is deposited.

EXAMPLE THICKNESSES

TABLE 3 Example Materials/Thicknesses; FIG. 5 Embodiment (Annealed)Preferred Range Most Preferred Layer ({acute over (Å)}) ({acute over(Å)}) Ex. (Å) Glass (1-10 mm thick) Si_(x)N_(y) (layer 3) 70-1200 Å200-350 Å 294 Å TiO_(x) (layer 5) 10-300 Å 100-140 Å 116 Å ZnO_(x)(layer 7) 10-110 Å 40-80 Å 60 Å Ag (layer 9) 10-200 {acute over (Å)}100-160 {acute over (Å)} 120 Å Ni_(x)Ti_(y)O_(z) (layer 11) 10-100{acute over (Å)} 15-40 {acute over (Å)} 25 Å TiO_(x) (layer 12) 10-150{acute over (Å)} 40-60 {acute over (Å)} 50 Å SnO_(x) (layer 13) 70-1200Å 200-700 Å 270 Å Si_(x)N_(y) (layer 14) 10-300 Å 100-140 Å 110 ÅSnO_(x) (layer 15) 70 to 1200 Å 100-200 Å 163 Å ZnOx (layer 17) 15-115 Å50-150 Å 130 Å Ag (layer 19) 10-300 Å 100-145 Å 130 Å NiTiOx (layer 21)10-150 {acute over (Å)} 20-50 {acute over (Å)} 25 Å SnOx (layer 23)70-1200 Å 300-700 Å 501 Å SixNy (layer 24) 10-300 Å 60-140 Å 100 Å SnOx(layer 25) 10-300 Å 100-200 Å 150 Å ZnOx (layer 27) 10-110 Å 40-80 Å 60Å Ag (layer 29) 10-300 Å 120-180 Å 161 Å NiTiOx (layer 31) 10-150 {acuteover (Å)} 15-50 {acute over (Å)} 25 Å SnOx (layer 32) 10-300 Å 100-210 Å155 Å SixNy (layer 16) 70-1200 Å 200-300 Å 256 Å

In certain example embodiments, the top Ag-based layer is the thickestin the layer stack. This arrangement has been found to help improveemissivity of the coating. Also, in certain example embodiments, themiddle Ag-based layer is thinner than the top Ag-based layer, which hasbeen found to help maintain the improved emissivity, while also itselfimproving off-axis color stability and helping to provide high visibletransmission.

It surprisingly and unexpectedly has been found that the introduction ofthe second layer comprising titanium oxide 12 in the lower middledielectric layer stack improved the quality of the underlying Ag-basedlayer 9. This is believed to be a result of less tin oxide from layer 13interfering with the underlying first contact layer 11 directly adjacentto the first Ag-based layer 9.

Moreover, in certain example laminated embodiments of this invention,coated articles herein that have been optionally heat treated to anextent sufficient for heat strengthening or tempering, and that havebeen coupled to another glass substrate to form an IG unit, may have thefollowing IG unit optical/solar characteristics.

In the context of IG units, for example, the use of NiTiOxadvantageously allows for higher LSG values to be obtained. Forinstance, in certain example instances, an LSG of 2.15 or higher ispossible, whereas an LSG value of around 2.1 or lower is possible ifonly NiCr based layers are used without NiTiOx inclusive layers. As willbe appreciated by those skilled in the art, a high LSG value isadvantageous because it is indicative of high visible transmissioncoupled with low SHGC, thus keeping heat out and letting light in.

The FIG. 5 example embodiment is particularly well suited for use in anannealed product. Modifications may or may not be made for heattreatable embodiments. For example, in heat treatable exampleembodiments one or both of the layers 5 and/or 12 including TiOx may beremoved. As another example, in the heat treatable coating, some or allof the layers 14, 24, and 16 comprising SiN may be made more metallicthan in the annealed counterpart. Still further, some or all of thelayers comprising NiTiOx may be replaced with layers comprising NiCr oran oxide thereof The table below shows example materials and thicknessesfor a heat treatable coated article similar to that shown in FIG. 5, butmodified in view of the foregoing.

TABLE 4 Example Materials/Thicknesses; FIG. 5 Embodiment Modified (HeatTreatable) Preferred Range More Preferred Example Layer (nm) (nm) (nm)SiN 25.9-38.9 29.2-35.6 32.4 ZnO 5.6-8.4 6.3-7.7 7 Ag 10.2-15.211.4-14   12.7 NiCrOx 2.4-3.6 2.7-3.3 3 SnO 35.9-53.9 40.4-49.4 44.9 SiN 8-12  9-11 10 SnO 12.2-18.2 13.7-16.7 15.2 ZnO 5.2-7.8 5.9-7.2 6.5 Ag11.2-16.8 12.6-15.4 14 NiTiOx 2.4-3.6 2.7-3.3 3 SnO 36.6-55   41.2-50.445.8 SiN  8-12  9-11 10 SnO 12-18 13.5-16.5 15 ZnO 5.2-7.8 5.9-7.2 6.5Ag 15.1-22.7   17-20.8 18.9 NiCrOx 2.4-3.6 2.7-3.3 3 SnO 11.2-16.812.6-15.4 14 SiN 23.4-35.2 26.4-32.2 29.3

Furthermore, in heat treated example embodiments, one or more “glue”layers comprising SnO may be reduced in thickness and/or removedcompletely. In such cases, it may be desirable to increase the thicknessof the underlying layer(s) comprising SnO. For instance, layers 15and/or 25 may have a reduced thickness (e.g., from about 15 nm to about10 nm) and/or may be removed completely. Correspondingly, layers 13and/or 23 may have an increased thickness. The amount of the increasedthickness may be about 8-12 nm. Thus, in certain example embodiments,layer 15 may have a reduce thickness of about 8-12 nm, more preferably9-11 nm, and sometimes about 10 nm, while the layer 13 may have anincreased thickness of about 40.9-61.3 nm, more preferably 46-56.2 nm,and sometimes about 51.1 nm. Similarly, layer 25 may have a reducethickness of about 8-12 nm, more preferably 9-11 nm, and sometimes about10 nm, while the layer 23 may have an increased thickness of about40.6-61 nm, more preferably 45.7-55.9 nm, and sometimes about 50.8 nm.In addition, or in the alternative, one of more of the middle dielectriclayer stacks may include a layer comprising ZnSnO This layer may beformed, for example, by co-sputtering (e.g., from Zn or ZnO targets andSn or SnO targets). The ZnSnO inclusive layers may be provided in placeof or in addition to the layers comprising SnO on one or both sidesthereof

The table below includes performance data for the FIG. 5 exampleembodiment in the annealed state, as well as a modification to the FIG.5 example embodiment in which the layers 5 and 12 comprising TiOx areomitted and where the coated article is heat treated when disposed on6.0 mm clear float glass, e.g., in accordance with the table above. Ofcourse, different thickness substrates and/or different compositionsubstrates may be used in different embodiments. It will be appreciatedthat the preferred ranges may be the same or similar for annealed andheat treated embodiments. It also will be appreciated that theperformance will be approximately comparable for annealed and heattreated embodiments, but with heat treated embodiments out-performingannealed embodiments in terms of transmission.

TABLE 5 Example Performance Characteristics for Monolithic CoatedArticles More Annealed HT Parameter Preferred Preferred Example SampleSample Transmittance Y (%) >=55 >=65 68.9 67.7 68.7 T a* −7.0-−3.1  −6-−4.1 −5.1 −6.1 −5.6 T b* −1.3-2.7   −0.3-1.7   0.7 4.5 6.0 T L*84.9-88.0 85.7-87.3 86.5 85.9 86.4 Film Side Reflectance Y (%) 1.6-8.63.3-6.9 4.9 8.5 7.1 Rf a* −2.0-6.0   −0.08-3.9    1.9 −6.0 −1.0 Rf b*−16.0-−8.1  −14.0-−10.1 −12.1 −2.9 −5.1 Rf L* 16.4-36.4 21.4-31.5 26.435.1 32.0 Glass Side Reflectance Y (%)  4.3-10.7 5.9-9.2 7.4 5.5 4.5 Rga* −5.1-0.9   −3.6-−0.7 −2.1 −3.6 −1.0 Rg b* −11.3-−3.4  −9.3-−5.4 −7.3−1.4 −4.5 Rg L* 25.7-39.7 29.2-36.2 32.7 28.0 25.2 Glass SideReflectance 45° Y (%)  5.4-12.8  7.3-11.0 9.0 Rg a* −3.8-2.1  −2.3-0.7   −0.9 Rg b* −4.1-3.8   −2.1-1.9   −0.1 Rg L* 28.9-43.032.4-39.5 36.0 Sheet Resistance (ohms/sq) 1.1-1.9 1.3-1.7 1.5 1.2 1.0Normal Emissivity (%) 1-4 1-3 2.00

The table below includes performance data for an IG unit including acoated article as shown in the FIG. 5 example embodiment in the annealedstate, as well as a modification to the FIG. 5 example embodiment inwhich the layers 5 and 12 comprising TiOx are omitted and where thecoated article is heat treated, e.g., where the coating is disposed onsurface 2 of the IG unit. The examples in the table below include firstand second 6.0 mm substrates separated by a 12 mm gap filled with air.Of course, different thickness substrates, different compositionsubstrates, different gap sizes, different gases, etc., may be used indifferent embodiments. It will be appreciated that the preferred rangesmay be the same or similar for annealed and heat treated embodiments. Italso will be appreciated that the performance will be approximatelycomparable for annealed and heat treated embodiments, but with heattreated embodiments out-performing annealed embodiments in terms oftransmission.

TABLE 6 Example Performance Characteristics for IG Units More AnnealedHT Parameter Preferred Preferred Example Sample SampleT_(vis) >=55   >=60   61.6 60.7 61.6 (or TY) (%) T_(uv) (%) <=10   <=4  4.7 4.6 6.0 T_(sol) (%) <=30   <=23   23.6 23.2 22.9 R_(sol) (%) <=50  <=40   38.6 38.6 39.4 SHGC <=30   <=27   27.4 27.1 26.8 U-Value <=1.8 <=1.63 0.290 0.286 0.285 LSG >=2.10 >=2.15 2.25 2.24 2.30 (e.g., 2.20,2.26, 2.33, etc.)

In certain example embodiments, the nickel titanium-based layer may bedeposited by sputtering from a metallic target. In some cases, thetarget may comprise 20% nickel and 80% titanium by weight. In otherexample embodiments, the metallic target may comprise 50% nickel and 50%titanium by weight. A metallic sputtering target of or including nickeland titanium may include from about 1 to 50% Ni (and all subrangestherebetween), more preferably from about 2 to 50% Ni (and all subrangestherebetween), and most preferably from about 5 to 20% Ni (and allsubranges therebetween), in certain example embodiments (all percentagesbeing weight %). The metallic sputtering target of or including nickeland titanium may further comprise from about 50 to 99% Ti (and allsubranges therebetween), more preferably from about 50 to 98% Ti (andall subranges therebetween), and most preferably from about 80 to 95% Ti(and all subranges therebetween), in certain example embodiments (allpercentages being weight %).

In still further example embodiments, the nickel-titanium based layermay be deposited by more than one sputtering target. In some cases,there may be a metallic Ni target and a metallic Ti target. In certainexamples, the layer based on Ni and/or Ti may be sputter deposited inthe presence of one or more noble and/or reactive gases. In certainexemplary embodiments, the Ni and Ti may be deposited in the presence ofat least argon and oxygen. In other example embodiments, one or more ofthe targets may be ceramic. For example, the barrier layer may bedeposited using at least a metallic target comprising nickel, and aceramic target comprising an oxide of titanium, and/or a metallic targetcomprising titanium and a ceramic target comprising an oxide of nickel.Furthermore, in still further example embodiments, one, two, or moreceramic targets may be used to deposit a layer comprising an oxide ofnickel titanium.

In certain example embodiments, only some contact layers may comprise Niand/or Ti and/or oxides and nitrides thereof In other exampleembodiments, other contact layers may comprise Ni and/or Cr, and/oroxides and nitrides thereof In further example embodiments, othercontact layers may comprise zinc and/or oxides thereof

The use of a contact layer based on nickel titanium and/or an oxidethereof has advantageously been found to increase the mechanical andchemical durability of the coated article, without sacrificing opticalproperties, such that a single silver layer stack (e.g., a low-E coatingcomprising only one layer of silver) may be used in monolithicinstances, on surface 1 and/or surface 2 of a glass substrate (e.g., thecoating may face the interior or exterior). However this invention isnot so limited, and a low-E coating including a Ni_(x)Ti_(y)O_(z)barrier layer may be used on any surface in any configuration, accordingto different example embodiments.

Although certain example embodiments have been described as relating tolow-E coatings, the Ni and/or Ti inclusive layers described herein maybe used in connection with different types of coatings.

FIGS. 6 and 7 are further detailed cross-sectional views of examplecoated articles in accordance with example embodiments of thisinvention. This FIG. 6 example is suitable for use in the as-depositedor annealed state. The glass substrate 602 in FIG. 6 supports a coating604, which includes a silicon-inclusive base layer 606. Although thesilicon-inclusive base layer 606 in FIG. 6 is show as being SiNx,different embodiments may include an oxided and/or nitridedsilicon-inclusive layer 606. The silicon-inclusive base layer 606supports a layer comprising titanium oxide 608 (e.g., TiO₂ or othersuitable stoichiometry) and a layer comprising zinc oxide 610. The layercomprising zinc oxide 610 may be in contact with the first Ag-basedlayer 612. A first contact layer 614 comprising Ni and/or Cr may beprovided over and contacting the first Ag-based layer 612 in certainexample embodiments.

A second layer comprising titanium oxide 616 (e.g., TiO₂ or othersuitable stoichiometry) is located over the first contact layer 614, andthe second layer comprising titanium oxide 616 supports a mixed orgraded layer 618 comprising ZnSnOx and tin oxide. In certain exampleembodiments, however, discrete layers comprising ZnSnOx and tin oxidemay be provided in place of a mixed or graded layer. In embodimentswhere a mixed or graded layer 618 comprising ZnSnOx and tin oxide isprovided, the layer may be graded so that there is more SnOx and less Zncloser to the underlying second layer comprising titanium oxide 616.This may be desirable if the ZnO/Ag/contact layer stack is repeated, asis shown in FIG. 6.

That is, in FIG. 6, the mixed or graded layer 618 comprising ZnSnOx andtin oxide supports, in order moving outwardly, a second layer comprisingzinc oxide 620, a second Ag-based layer 622, and a second contact layer624 comprising Ni and/or Cr.

A second silicon-inclusive layer 626 is provided above the secondcontact layer. Similar to the silicon-inclusive base layer 606, thesecond silicon-inclusive layer 626 is shown as comprising SiNx. However,different embodiments may include an oxided and/or nitrided secondsilicon-inclusive layer 626. The second silicon-inclusive layer 626supports a layer comprising tin oxide 628, and the ZnO/Ag/contact layerstack may be repeated once again. That is, as shown in FIG. 6, the layercomprising tin oxide 628 supports a third layer comprising zinc oxide630, a third Ag-based layer 632, and a third contact layer 634comprising Ni and/or Cr. A second layer comprising tin oxide 636 may beprovided over the third contact layer 634. A silicon-inclusive overcoatlayer 238 may be provided as an outermost layer and, as with the othersilicon-inclusive layers below, different embodiments may be oxidedand/or nitrided. The FIG. 6 example shows an overcoat layer 638comprising SiNx.

It will be appreciated that the contact layers described herein may beoxided in different embodiments of this invention. Thus, certain exampleembodiments may include NiCrOx contact layers over and contactingunderlying Ag-based layers. It also will be appreciated that any or allof the NiCr and/or NiCrOx layers may be replaced with NiTi and/orNiTiOx.

Similar to as discussed above, it surprisingly and unexpectedly has beenfound that the introduction of the second layer comprising titaniumoxide 616 in the lower middle dielectric layer stack improved thequality of the underlying Ag-based layer 612. This is believed to be aresult of less SnO₂ from the combined layer 618 comprising (ZnSnOx/SnO₂)interfering with the underlying first contact layer 614 directlyadjacent to the first Ag-based layer 612.

Example layer thicknesses for the layers shown in the FIG. 6 exampleembodiment are provided in the following table:

TABLE 7 Example Layer Stack for FIG. 6 Coated Article Preferred MoreExample Thickness Preferred Thickness Layer (nm) Thickness (nm) (nm)SiNx (206) 5.5-9.3 6.6-8.2 7.4 TiO₂ (208) 3-5 3.6-4.4 4.0 ZnO (210) 6.6-11.2 8.0-9.8 8.9 Ag (212)  9-15 10.8-13.2 12.0 NiCrOx (214) 2.6-4.43.1-3.9 3.5 TiO₂ (216) 5.2-8.8 6.3-7.7 7.0 ZnSnOx/SnO₂ (218) 37.5-62.745.0-55.2 50.1 ZnO (220) 13.2-22.1 15.9-19.5 17.7 Ag (222)  9-1510.8-13.2 12.0 NiCrOx (224) 2.6-4.4 3.1-3.9 3.5 SiNx (226)  7.5-12.5 9-11 10.0 SnO₂ (228) 19.8-33.1 23.8-29.2 26.5 ZnO (230) 19.9-33.323.9-29.3 26.6 Ag (232)  9.3-15.7 11.2-13.8 12.5 NiCrOx (234) 2.6 to 4.43.1-3.9 3.5 SnO₂ (236)  8.5-14.2 10.2-12.6 11.4 SiNx (238) 12.7-21.315.3-18.7 17.0

FIG. 7 is another detailed cross-sectional view of an example coatedarticle in accordance with an example embodiment. The FIG. 7 example issuitable for use in the heat treated state. The FIG. 7 example issimilar to the FIG. 6 example in that a substrate 702 supports a coating704 with many of the same layers in much the same order. The differencesbetween the FIG. 6 example embodiment and the FIG. 7 example embodimentinclude the lack of a first layer comprising titanium oxide below thefirst silver based layer 710, and the provision of separate layerscomprising SnOx 716 and ZnSnOx 718 and in the lower middle dielectric,as opposed to a single mixed layer comprising (ZnSnOx/SnO2).

Thus, FIG. 7 includes, in order moving away from the substrate 702: asilicon-inclusive base 706, a first layer comprising zinc oxide 708below a first Ag-based layer 710, a first contact layer 712 comprisingNi and/or Cr, a layer comprising titanium oxide 714 (e.g., TiO₂ or othersuitable stoichiometry), separate layers comprising tin oxide 716 andZnSnOx 718, a second layer comprising zinc oxide 720, a second Ag-basedlayer 722, a second contact layer 724 comprising Ni and/or Cr, a secondsilicon inclusive layer 726, a second layer comprising tin oxide 728, athird layer comprising zinc oxide 730, a third Ag-based layer 732, athird contact layer 734 comprising Ni and/or Cr, a third layercomprising tin oxide 736, and a silicon-inclusive overcoat layer 738.The options and/or alternatives described above, e.g., relating to thepossible alloying of the Ag-based layers, the oxiding of the contactlayers, the oxiding and/or nitriding of the silicon-inclusive layers,etc., are also options for the FIG. 7 example embodiment.

Example layer thicknesses for the layers shown in the FIG. 7 exampleembodiment are provided in the following table:

TABLE 8 Example Layer Stack for FIG. 7 Coated Article PreferredThickness More Preferred Example Thickness Layer (nm) Thickness (nm)(nm) SiNx (306) 8.4-14   10.0-12.32 11.2 ZnO (308)  8.2-13.8  9.9-12.111.0 Ag (310)  7.1-11.9  8.5-10.5 9.5 NiCrOx (312) 2.2-3.8 2.7-3.3 3.0TiO₂ (314) 2.2-3.8 2.7-3.3 3.0 SnO₂ (316) ZnSnOx (318) 43.5-73  52.2-63.8 58.0 ZnO (320) 12-20 14.4-17.6 16.0 Ag (322) 9.6-16  11.5-14.112.8 NiCrOx (324) 2.2-3.8 2.7-3.3 3.0 SiNx (326)  8.3-13.9   10-12.311.1 SnO₂ (328) 27.7-46.3 33.3-40.7 37.0 ZnO (330) 15-25 18-22 20.0 Ag(332) 10.0-16.8 12.0-14.8 13.4 NiCrOx (334) 2.2-3.8 2.7-3.3 3.0 SnO₂(336) 11.2-18.8 13.5-16.5 15.0 SiNx (338) 12.8-21.4 15.3-18.9 17.1

The FIG. 6 and FIG. 7 example embodiments may perform as per the tablebelow, e.g., when disposed on 6.0 mm clear float glass. Of course,different thickness substrates and/or different composition substratesmay be used in different embodiments. It will be appreciated that thepreferred ranges may be the same or similar for annealed and heattreated embodiments. It also will be appreciated that the performancewill be approximately comparable for annealed and heat treatedembodiments, but with heat treated embodiments out-performing annealedembodiments in terms of transmission.

TABLE 9 Example Performance Characteristics for FIG. 6 and FIG. 7 CoatedArticles Annealed HT Parameter Preferred More Preferred Ex. 1 Ex. 2 Ex.1 Transmittance Y (%) 61.6-70.8 64.0-68.5 65.6 66.2 70.7 T a* −6.7-−2.7−5.7-−3.7 −3.4 −4.7 −3.8 T b* 1.9-6.1 3.1-5.1 1.9 4.1 1.0 T L* 82.7-87.584.0-86.3 84.8 85.1 87.3 Film Side Reflectance Y (%) 3.8-6.0 4.4-5.4 3.34.9 4.25 Rf a*  8.8-12.8  9.8-11.8 −1.7 10.8 −3.9 Rf b* −12.6-−8.6 −11.6-−9.6  4.1 −10.6 1.4 Rf L* 23.9-29.4 24.9-27.9 21.1 26.4 24.5 GlassSide Reflectance Y (%)  6.4-10.4 7.4-9.4 5.2 8.4 5.81 Rg a* −3.4-+0.4−2.4-−0.4 −0.8 −1.4 −1.5 Rg b* −12.8-−8.8  −11.8-−9.8  −1.0 −10.8 −1.33Rg L* 30.8-38.8 32.8-36.8 27.3 34.8 28.9 Glass Side Reflectance 45° Y(%)  7.4-10.8  8.5-10.7 7.5 9.6 8.3 Rg a* −3.0-+5.0 −1.0-+3.0 0.7 1.00.35 Rg b* −13.4-−1.4  −10.4-−4.4  1.5 −7.4 1.5 Rg L* 33.1-41.135.1-39.1 32.8 37.1 34.6 Sheet Resistance (ohms/sq) 1-5 1.2-1.8 1.11 1.51.07 Normal Emissivity (%) 0.25-5.00 1.00-3.00 2.00

When the FIG. 6 and FIG. 7 example coated articles are incorporated inIG units, they may perform as shown in the following table. The annealedexample in the table below includes a first ExtraClear substrate that is6.0 mm thick and a second ExtraClear substrate that is 4 mm thick, withan air gap of 16 mm filled with 90% Ar gas. The heat treated exampleshave first and second substrates of 3 mm and 6mm thick respectively,with 12 separations of 12 mm Of course, different thickness substrates,different composition substrates, different gap sizes, different gases,etc., may be used in different embodiments. It will be appreciated thatthe preferred ranges may be the same or similar for annealed and heattreated embodiments. It also will be appreciated that the performancewill be approximately comparable for annealed and heat treatedembodiments, but with heat treated embodiments out-performing annealedembodiments in terms of transmission.

TABLE 10 Example Performance Characteristics for IG Units Based on FIG.6 and FIG. 7 Examples More AC HT Parameter Preferred Preferred Ex. 1 Ex.1 Ex. 2 Transmittance Y (%) 56.1-64.3 58.1-62.2 60.1 63.9 62.0 T a* −7to −3 −6-−4 −5.0 −4.11 −5.45 T b* 2.1-6.1 3.1-5.1 4.1 0.17 0.16 T L*79.7-84.1 80.8-83.0 81.9 83.9 82.9 Outside Reflectance Y (%)  8.9-15.610.0-14.5 12.1 10.5 10.3 R out, a* −4.7-−0.7 −3.7-−1.7 −2.7 −3.25 −3.75R out, b* −10.8-−4.8  −8.8-−6.8 −7.8 −0.04 −0.06 R out, L* 34.4-48.437.9-44.9 41.4 38.8 38.4 Inside Reflectance Y (%)  8.3-16.3 10.3-14.312.2 11.8 11.5 R in a* 2.6-6.6 3.6-5.6 4.6 −1.71 −2.36 R in b* −7.4-−3.4−6.4-−4.4 −5.4 −1.30 −1.30 Rg L* 36.7-46.3 38.3-44.7 41.5 40.9 40.4

The thermal performance of certain example IG units may be as follows,e.g., when the as-deposited coatings are provided on surface 2 of an IGunit having a 6 mm and 4 mm thick ExtraClear glass substrates and a 16mm gap filled with 90% Ar:

TABLE 11 Example Thermal Performance Characteristics for IG Units Basedon FIG. 6 and FIG. 7 Examples Parameter Preferred More Preferred ExampleNFRC 2001 Preferred More Preferred Example Visible Transmission(%) >=50 >=55 60.0 Solar Transmission (%) <=21-29 <=23-27 25.0 SolarR_(out) Reflectance (%) <=40-48 <=42-46 44.0 Solar Absorption (%)<=27-35 <=29-33 31.0 SHGC (%) <=23-31 <=25-29 27.0 T_(uv) (%) <=7-19<=10-16 13.0 LSG (SHGC) >=2.02-2.38 >=2.12-2.30  2.22 U-value (BTU/[hft² F])) <=0.1-0.4 <=0.1-0.3  0.194

The thermal characteristics of Examples 1 and 2 of the heat treatedembodiment above may be as follows:

TABLE 12 Preferred Example 1 Example 2 T_(solar) 18.7-31.3 25.69 24.40R_(solar) (2) 32.1-53.7 47.26 38.52 R_(solar) (3) 31.6-52.8 46.38 37.96T_(uv)  6.7-11.3 9.74 8.31 T_(dw) 34.8-58.2 47.48 45.58 U_(winter) (air)0.2-0.4 0.27 0.27 U_(summer) (air) 0.2-0.4 0.29 0.29 Emissivity (normal)0.01-0.05 0.020 0.020 Emissivity (hemispherical) 0.01-0.05 0.026 0.026SHGC (2) 0.2-0.4 0.282 0.283 SHGC (3) 0.3-0.6 0.417 0.407 SC (2) 0.2-0.50.33 0.33 SC (3) 0.3-0.6 0.48 0.47 RHG (2) 52.5-87.5 70 70 RHG (3) 75-125 101 99 LSG 1.6-2.8 2.27 2.19

A coated article as described herein (e.g., see FIGS. 1-7) may or maynot be heat-treated (e.g., tempered) in certain example embodiments. Theterms “heat treatment” and “heat treating” as used herein mean heatingthe article to a temperature sufficient to achieve thermal temperingand/or heat strengthening of the glass inclusive article. Thisdefinition includes, for example, heating a coated article in an oven orfurnace at a temperature of at least about 550 degrees C., morepreferably at least about 580 degrees C., more preferably at least about600 degrees C., more preferably at least about 620 degrees C., and mostpreferably at least about 650 degrees C. for a sufficient period toallow tempering and/or heat strengthening. This may be for at leastabout two minutes, or up to about 10 minutes, in certain exampleembodiments.

As indicated above, certain example embodiments may include a low-Ecoating supported by a glass substrate. This coated article may be usedmonolithically or laminated to another glass or other substrate. Thecoated article also may be built into an insulated glass (IG) unit. IGunits generally comprise first and second substantially parallel spacedapart glass substrates. A seal is provided around the periphery of thesubstrates, and a gap (which may be at least partially filled with aninert gas such as Ar, Xe, Kr, and/or the like) is maintained between thesubstrates.

The coated articles shown and described herein, or similar coatedarticles, may be laminated to another sheet of glass in certain exampleembodiments. A polymer-based interlayer may be used in certainimplementations. Materials such as, for example, PVB, EVA, etc., may beused in different embodiments. In such cases, the coating may beprovided between the substrates (e.g., on surface 2 or 3) of theresulting laminated article.

Some or all of the layers described herein may be disposed via sputterdepositing or any other suitable technique such as, for example, CVD,combustion deposition, etc. Example layers comprising Ni and Ti, forexample, may be sputter-deposited from one or more sputtering targets.The sputtering targets may include about 1-50% Ni and about 50-99% Ti,more preferably 5-40% Ni and about 60-95% Ti, and still more preferablyabout 10-30% Ni and about 70-90% Ti. In certain example embodiments, theNi:Ti ratio in the sputtering target may be about 20:80. Other Ni:Tiratios are possible in different embodiments including, for example,95/5; 75/25; 50/50; 25/75; 20/80; 10/90; etc. Sub-ranges of these rangesalso are contemplated herein. Furthermore, it will be appreciated thatthe these percentages/ratios may apply with respect to the amount of Niand/or Ti in the layers, whether such layers are fully or partiallyoxided or non-oxided (e.g., metallic).

The example materials disclosed herein may be used in connection withlow-E, anticondensation, and/or other application. Example low-E and/oranticondensation coatings are described in, for example, applicationSer. Nos. 12/926,714; 12/923,082; 12/662,894; 12/659,196; 12/385,234;12/385,802; 12/461,792; 12/591,611; and 12/654,594, the entire contentsof which are hereby incorporated herein by reference. Thus, in certainexample embodiments, one or more of the barrier layer materialsdescribed herein may replace or supplement one of more of the layerscomprising Ni and/or Cr in these and/or other types of coatings.

In the tables above, optical data was gathered with an III. “C” observer(2 degrees). The thermal performance data was gathered in accordancewith NFRC 2001.

As used herein, the terms “on,” “supported by,” and the like should notbe interpreted to mean that two elements are directly adjacent to oneanother unless explicitly stated. In other words, a first layer may besaid to be “on” or “supported by” a second layer, even if there are oneor more layers therebetween.

While the invention has been described in connection with what ispresently considered to be the most practical and preferred embodiment,it is to be understood that the invention is not to be limited to thedisclosed embodiment, but on the contrary, is intended to cover variousmodifications and equivalent arrangements included within the spirit andscope of the appended claims.

1-26. (canceled)
 27. A method of making an insulated glass (IG) unitincluding a coated article including a coating supported by a glasssubstrate, the method comprising: having a coated article comprising: afirst dielectric layer on the substrate; a first layer comprising Agover at least the first dielectric layer; a second dielectric layer overat least the first layer comprising Ag; a second layer comprising Agover at least the second dielectric layer; a first layer comprising Niand Ti over and contacting the second layer comprising Ag; a thirddielectric layer over at least the first layer comprising Ni and Ti; athird layer comprising Ag over at least the third dielectric layer; asecond layer comprising Ni and Ti over and contacting the third layercomprising Ag; a fourth dielectric layer over at least the second layercomprising Ni and Ti; and wherein each of the first and second layerscomprising Ni and Ti has a metal content of from about 10-30% Ni andfrom about 70-90% Ti; and making the IG unit via steps comprising:positioning a second substrate in substantially parallel spaced apartrelation to said coated article so as to form a gap therebetween;coupling said coated article and the second substrate, wherein thecoating of the coated article is provided on surface 2 or surface 3 ofthe IG unit; and wherein the IG unit has a LSG of greater than or equalto 2.15.
 28. The method of claim 27, wherein the second substrate andthe substrate of the coated article are each about 6 mm thick, andwherein the gap between the coated article and the second substrate isabout 12 mm.
 29. The method of claim 27, wherein the coating has a sheetresistance of less than or equal to about 1.2.
 30. The method of claim27, wherein the coated article has a visible transmission of at least65%.
 31. The method of claim 27, wherein the first dielectric layercomprises zinc oxide, and wherein the first layer comprising Ag islocated on and directly contacting the first dielectric layer.
 32. Themethod of claim 27, wherein the fourth dielectric layer comprisessilicon nitride.
 33. The method of claim 27, wherein at least one of thelayers comprising Ni and Ti is from 10-45 angstroms thick.
 34. A methodof making an insulated glass (IG) unit including a coated articleincluding a coating supported by a glass substrate, the methodcomprising: having a coated article comprising: a first dielectric layeron the substrate; a first layer comprising Ag over at least the firstdielectric layer; a second dielectric layer over at least the firstlayer comprising Ag; a second layer comprising Ag over at least thesecond dielectric layer; a first layer comprising Ni over and contactingthe second layer comprising Ag; a third dielectric layer over at leastthe first layer comprising Ni; a third layer comprising Ag over at leastthe third dielectric layer; a second layer comprising Ni over andcontacting the third layer comprising Ag; a fourth dielectric layer overat least the second layer comprising Ni; and and making the IG unit viasteps comprising: positioning a second substrate in substantiallyparallel spaced apart relation to said coated article so as to form agap therebetween; coupling said coated article and the second substrate,wherein the coating of the coated article is provided on surface 2 orsurface 3 of the IG unit; and wherein the IG unit has a LSG of greaterthan or equal to 2.15.
 35. The method of claim 34, wherein the secondsubstrate and the substrate of the coated article are each about 6 mmthick, and wherein the gap between the coated article and the secondsubstrate is about 12 mm.
 36. The method of claim 34, wherein thecoating has a sheet resistance of less than or equal to about 1.2. 37.The method of claim 34, wherein the coated article has a visibletransmission of at least 65%.
 38. The method of claim 34, wherein thefirst dielectric layer comprises zinc oxide, and wherein the first layercomprising Ag is located on and directly contacting the first dielectriclayer.
 39. The method of claim 24, wherein the fourth dielectric layercomprises silicon nitride.